Line width roughness (LWR) performance of novel surface conditioner solutions for immersion lithography
- 著者名:
- 掲載資料名:
- Advances in resist materials and processing technology XXV
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6923
- 発行年:
- 2008
- 巻:
- 2
- 開始ページ:
- 69233G-1
- 終了ページ:
- 69233G-9
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819471086 [0819471089]
- 言語:
- 英語
- 請求記号:
- P63600/6923
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
3
国際会議録
Effect of line-edge roughness (LER) and line-width roughness (LWR) on sub-100-nm device performance
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |