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Alignment system and process optimization for improvement of double patterning overlay

著者名:
  • W. Ma ( Hynix Semiconductor,INC., South Korea )
  • J. Kang ( Hynix Semiconductor,INC., South Korea )
  • C. Lim ( Hynix Semiconductor,INC., South Korea )
  • H. Kim ( Hynix Semiconductor,INC., South Korea )
  • S. Moon ( Hynix Semiconductor,INC., South Korea )
掲載資料名:
Metrology, inspection, and process control for microlithography XXII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6922
発行年:
2008
巻:
2
開始ページ:
69222T-1
終了ページ:
69222T-8
総ページ数:
8
出版情報:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819471079 [0819471070]
言語:
英語
請求記号:
P63600/6922
資料種別:
国際会議録

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