Exploring the limitations of x-ray reflectivity as a critical dimension pattern shape metrology
- 著者名:
- H.-J. Lee ( National Institute of Standards and Technology, USA )
- S. Kim ( National Institute of Standards and Technology, USA )
- C. L. Soles ( National Institute of Standards and Technology, USA )
- E. K. Lin ( National Institute of Standards and Technology, USA )
- W. Wu ( National Institute of Standards and Technology, USA )
- 掲載資料名:
- Metrology, inspection, and process control for microlithography XXII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6922
- 発行年:
- 2008
- 巻:
- 2
- 開始ページ:
- 692224-1
- 終了ページ:
- 692224-8
- 総ページ数:
- 8
- 出版情報:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819471079 [0819471070]
- 言語:
- 英語
- 請求記号:
- P63600/6922
- 資料種別:
- 国際会議録
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