Sources of overlay error in double patterning integration schemes

Sources of overlay error in double patterning integration schemes

著者名:

D. Laidler ( IMEC, Belgium )
P. Leray ( IMEC, Belgium )
K. D'havé ( IMEC, Belgium )
S. Cheng ( IMEC, Belgium )

掲載資料名:

Metrology, inspection, and process control for microlithography XXII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6922

発行年:

2008

巻:

1

開始ページ:

69221E-1

終了ページ:

69221E-11

総ページ数:

11

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819471079 [0819471070]

言語:

英語

請求記号:

P63600/6922

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052553
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
回次:	2008 : 22nd
会議開催地:	San Jose, California, USA
会議開催年:	2008.02.25-2008.02.28
論文注記:	Metrology, inspection, and process control for microlithography XXII, San Jose, California, USA, 25-28 February 2008 - Session 10. Overlay II (69221E/6922-49)

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1 国際会議録 Cluster optimization to improve CD control as an enabler for double patterning L. Tedeschi, C. Rosslee, D. Laidler, P. Leray, K. D'havé Society of Photo-optical Instrumentation Engineers	7 国際会議録 Pitch doubling through dual-patterning lithography challenges in integration and litho budgets M. Dusa, J. Quaedackers, O. F. A. Larsen, J. Meessen, E. van der Heijden, G. Dicker, O. Wismans, P. de Haas, K. van I. … SPIE - The International Society of Optical Engineering
2 国際会議録 Comparison of pattern placement errors as measured using traditional overlay targets and design rule structures Leray, P., Laidler, D.W., Pollentier, I.K. SPIE-The International Society for Optical Engineering	8 国際会議録 Analysis of nonlinear overlay errors by aperture mixing related with pattern asymmetry Lim,C.-M., Kwon,K.-S., Yim,D., Son,D.-H., Kim,H.-S., Baik,K.-H. SPIE-The International Society for Optical Engineering
3 国際会議録 Comparison of back side chrome focus monitor to focus self-metrology of an immersion scanner K. D'have, T. Machida, D. Laidler, S. Cheng SPIE - The International Society of Optical Engineering	9 国際会議録 Advances in process overlay Hinnen,P.C., Megens,H.J.L., Schaar,M.van der, Haren,R.J.F.van, Mos,E.C., Lalbahadoersing,S., Bornebroek,F., Laidler,D. SPIE-The International Society for Optical Engineering
4 国際会議録 Knowledge-based APC methodology for overlay control Laidler, D.W., Leray, P., Crow, D.A., Roberts, K.E. SPIE-The International Society for Optical Engineering	10 国際会議録 Double patterning overlay and CD budget for 32 nm technology node U. Iessi, S. Loi, A. Salerno, P. Rigolli, E. De Chiara Society of Photo-optical Instrumentation Engineers
5 国際会議録 Characterization of overlay mark fidelity Adel, M., Ghinovker, M.E., Poplawski, J.M., Kassel, E., Izikson, P., Pollentier, I.K., Leray, P., Laidler, D.W. SPIE-The International Society for Optical Engineering	11 国際会議録 Split and design guidelines for double patterning V. Wiaux, S. Verhaegen, S. Cheng, F. Iwamoto, P. Jaenen Society of Photo-optical Instrumentation Engineers
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