Advanced profile control and the impact of sidewall angle at gate etch for critical nodes

Advanced profile control and the impact of sidewall angle at gate etch for critical nodes

著者名:

H. Lee ( Tokyo Electron America,INC., USA )
A. Ranjan ( Tokyo Electron America,INC., USA )
D. Prager ( Tokyo Electron America,INC., USA )
K. A. Bandy ( IBM Microelectronics, USA )
E. Meyette ( IBM Microelectronics, USA )

掲載資料名:

Metrology, inspection, and process control for microlithography XXII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6922

発行年:

2008

巻:

1

開始ページ:

69220T-1

終了ページ:

69220T-13

総ページ数:

13

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819471079 [0819471070]

言語:

英語

請求記号:

P63600/6922

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052553
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
回次:	2008 : 22nd
会議開催地:	San Jose, California, USA
会議開催年:	2008.02.25-2008.02.28
論文注記:	Metrology, inspection, and process control for microlithography XXII, San Jose, California, USA, 25-28 February 2008 - Session 6. Scatterometry I (69220T/6922-27)

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