Diffraction based overlay metrology: accuracy and performance on front end stack

Diffraction based overlay metrology: accuracy and performance on front end stack

著者名:

P. Leray ( IMEC, Belgium )
S. Cheng ( IMEC, Belgium )
D. Kandel ( KLA- Tencor Corp., Israel )
M. Adel ( KLA- Tencor Corp., Israel )
A. Marchelli ( KLA- Tencor Corp., Israel )

掲載資料名:

Metrology, inspection, and process control for microlithography XXII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6922

発行年:

2008

巻:

1

開始ページ:

69220O-1

終了ページ:

69220O-12

総ページ数:

12

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819471079 [0819471070]

言語:

英語

請求記号:

P63600/6922

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052553
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
回次:	2008 : 22nd
会議開催地:	San Jose, California, USA
会議開催年:	2008.02.25-2008.02.28
論文注記:	Metrology, inspection, and process control for microlithography XXII, San Jose, California, USA, 25-28 February 2008 - Session 5. Overlay I (69220O/6922-23)

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