EUV pattern shift compensation strategies
- 著者名:
- T. Schmoeller ( T. KlimpeL Synopsys,Inc., Germany )
- I. Kim ( IMEC, Belgium )
- G. F. Lorusso ( IMEC, Belgium )
- A. Myers ( IMEC, Belgium )
- R. Jonckheere ( IMEC, Belgium )
- 掲載資料名:
- Emerging lithographic technologies XII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6921
- 発行年:
- 2008
- 巻:
- 1
- 開始ページ:
- 69211B-1
- 終了ページ:
- 69211B-8
- 総ページ数:
- 8
- 出版情報:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819471062 [0819471062]
- 言語:
- 英語
- 請求記号:
- P63600/6921
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
Society of Photo-optical Instrumentation Engineers |
4
国際会議録
Assessment of EUV reticle blank availability enabling the use of EUV tools today and in the future
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
6
国際会議録
Full field EUV lithography: lessons learned on EUV ADT imaging, EUV resist, and EUV reticles
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |