Imaging performance of the EUV alpha demo tool at IMEC

Imaging performance of the EUV alpha demo tool at IMEC

著者名:

G. F. Lorusso ( IMEC, Belgium )
J. Hermans ( IMEC, Belgium )
A. M. Goethals ( IMEC, Belgium )
B. Baudemprez ( IMEC, Belgium )
F. Van Roey ( IMEC, Belgium )

掲載資料名:

Emerging lithographic technologies XII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6921

発行年:

2008

巻:

1

開始ページ:

69210O-1

終了ページ:

69210O-10

総ページ数:

10

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819471062 [0819471062]

言語:

英語

請求記号:

P63600/6921

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052552
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Emerging Lithographic Technologies
回次:	2008 : 12th
会議開催地:	San Jose, California, USA
会議開催年:	2008.02.26-2008.02.28
論文注記:	Emerging lithographic technologies XII, San Jose, California, USA, 26-28 February 2008 - Session 5. EUV Systems (69210O/6921-24)

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4 国際会議録 Assessment of EUV reticle blank availability enabling the use of EUV tools today and in the future R. Jonckheere, G. F. Lorusso, A. Goethals, K. Ronse, J. Hermans, R. D. Ruyter SPIE - The International Society of Optical Engineering	10 国際会議録 193-nm lithography on a full-field scanner Goethals,A.-M., Pollers,I., Jaenen,P., Roey,F.Van, Ronse,K., Heskamp,B., Davies,G. SPIE - The International Society for Optical Engineering
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