Design of maskless lithography system based on DMD

Design of maskless lithography system based on DMD

著者名:

J. Ma ( Xi'an Univ. of Technology, China )
X. Du ( Xi'an Univ. of Technology, China )
Y. Liu ( Xi'an Univ. of Technology, China )

掲載資料名:

MEMS/MOEMS technologies and applications III : 12-14 November 2007, Beijing, China

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6836

発行年:

2008

開始ページ:

683612-1

終了ページ:

683612-8

総ページ数:

8

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819470119 [0819470112]

言語:

英語

請求記号:

P63600/6836

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052467
シリーズID:	PA00000029
会議名:	Photonics Asia : MEMS/MOEMS Technologies and Applications
回次:	2007 : 3rd
会議開催地:	Beijing, China
会議開催年:	2007.11.12-2007.11.14
論文注記:	MEMS/MOEMS technologies and applications III, 12-14 November 2007, Beijing, China - Poster Session (683612/6836-34)

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