Blank Cover Image

Analysis of the resolution doubling technique of high-resolution gratings by x-ray lithography

著者名:
  • J. Ma ( Institute of Microelectronics, China )
  • X. Zhu ( Institute of Microelectronics, China )
  • C. Xie ( Institute of Microelectronics, China )
  • M. Liu ( Institute of Microelectronics, China )
掲載資料名:
Quantum optics, optical data storage, and advanced microlithography : 12-14 November 2007, Beijing, China
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6827
発行年:
2008
パート:
C
開始ページ:
68272A-1
終了ページ:
68272A-7
総ページ数:
7
出版情報:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819470027 [0819470023]
言語:
英語
請求記号:
P63600/6827
資料種別:
国際会議録

類似資料:

1 国際会議録 Fabrication of 200 nm period x-ray transmission gratings using electron beam lithography

X. Zhu, C. Xie, T. Ye, M. Zhao, J. Ma

Society of Photo-optical Instrumentation Engineers
7 国際会議録 Refractive microlensarray made of silver-halide sensitized gelatin (SHSG) etched by enzyme with SLM-based lithography [6032-20]

Guo, X., Chen, M., Zhu, J., Ma, Y., Du, J., Guo, Y., Du, C.

SPIE - The International Society of Optical Engineering
2 国際会議録 Fabrication of transmission gratings for extreme ultraviolet interference lithography

J. Ma, X. Zhu, W. Zhu, C. Xie, T. Ye

Society of Photo-optical Instrumentation Engineers
8 国際会議録 Improved resolution in field-emission lithography machines

Chisholm,T., Wallman,B.A., Liu,H., Munro,E., Rouse,J., Zhu,X.

SPIE-The International Society for Optical Engineering
3 国際会議録 Fabrication of quantum dot array diffraction grating for soft x-ray spectroscopy

M. Zhao, X. Zhu, B. Chen, C. Xie, M. Liu

Society of Photo-optical Instrumentation Engineers
9 国際会議録 Spatial frequency analysis of optical lithography resolution enhancement techniques

Brueck,S.R.J., Chen,X.

SPIE - The International Society for Optical Engineering
4 国際会議録 Near-field diffraction analysis and simulation about nanoscale of Fresnel zone plate

J. Jang, C. Xie, X. Xu, X. Zhu, M. Liu

Society of Photo-optical Instrumentation Engineers
10 国際会議録 A new ZEP520/P(MMA-MAA)/ZEP520 trilayer process for T-shaped gate using synchrotron-based proximity x-ray lithography

Xie, C., Chen, D., Niu, J., Liu, M., Ye, T., Yi, F., Peng, L.

SPIE - The International Society of Optical Engineering
5 国際会議録 Analysis of off-axis shaped beam systems for high-throughput electron-beam lithography

Zhu,X., Liu,H., Munro,E., Rouse,J.

SPIE-The International Society for Optical Engineering
11 国際会議録 Fabrication of x-ray diffractive optical elements for ICF target diagnosis

X. Zhu, D. Wang, C. Xie, L. Cao, J. Yang

Society of Photo-optical Instrumentation Engineers
6 国際会議録 Analysis of nanometer-isolated trench diffract aerial image of both conventional and second-generation synchrotron-based proximity x-ray lithography

Xie, C., Chen, D., Liu, M., Ye, T., Yi, F.

SPIE - The International Society of Optical Engineering
12 国際会議録 Analysis of diffraction characteristics for arrayed-waveguide grating multiplexer

Guo, W.-B., Ma, C.-S., Chen, W.-Y., Sun, D.-M., Wang, G.-D., Dong, W., Zhang, X.-D., Zhang, D.-M., Liu, S.-Y.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12