The contact hole solutions for future logic technology nodes

The contact hole solutions for future logic technology nodes

著者名:

A. Chen ( ASML, Taiwan, China )
S. Hansen ( ASML, USA )
M. Moers ( ASML, Netherlands )
J. Shieh ( ASML, Taiwan, China )
A. Engelen ( K. van lngen Schenau, ASML, Netherlands )

掲載資料名:

Quantum optics, optical data storage, and advanced microlithography : 12-14 November 2007, Beijing, China

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6827

発行年:

2008

パート:

C

開始ページ:

68271O-1

終了ページ:

68271O-12

総ページ数:

12

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819470027 [0819470023]

言語:

英語

請求記号:

P63600/6827

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052458
シリーズID:	PA00000029
会議名:	Photonics Asia : Quantum Optics, Optical Data Storage, and Advanced Microlithography
回次:	2007
会議開催地:	Beijing, China
会議開催年:	2007.11.12-2007.11.14
論文注記:	Quantum optics, optical data storage, and advanced microlithography, 12-14 November 2007, Beijing, China - Part C. Advamces microlithography technology, Session 1. Leading Edge Optical Lithography (68271O/6827C-72)

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