New results from DUV water immersion microscopy using the CD metrology system LWM500 WI with a high NA condenser
- 著者名:
- F. Hillmann ( MueTec GmbH, Germany )
- G. Scheuring ( MueTec GmbH, Germany )
- H.-J. Brück ( MueTec GmbH, Germany )
- 掲載資料名:
- EMLC 2008 : 24th European Mask and Lithography Conference : 21-24 January 2008, Dresden, Germany
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6792
- 発行年:
- 2008
- 開始ページ:
- 679215-1
- 終了ページ:
- 679215-6
- 総ページ数:
- 6
- 出版情報:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819469564 [0819469564]
- 言語:
- 英語
- 請求記号:
- P63600/6792
- 資料種別:
- 国際会議録
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