Optical proximity correction for 0.13 µm SiGe:C BiCMOS

Optical proximity correction for 0.13 µm SiGe:C BiCMOS

著者名:

S. Geisler ( Technische Fachhochschule Wildau, Germany )
J. Bauer ( IHP Microelectronics, Germany )
U. Haak ( IHP Microelectronics, Germany )
U. Jagdhold ( IHP Microelectronics, Germany )
R. Pliquett ( IHP Microelectronics, Germany )

掲載資料名:

EMLC 2008 : 24th European Mask and Lithography Conference : 21-24 January 2008, Dresden, Germany

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6792

発行年:

2008

開始ページ:

679210-1

終了ページ:

679210-6

総ページ数:

6

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819469564 [0819469564]

言語:

英語

請求記号:

P63600/6792

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052423
シリーズID:	PA00000029
会議名:	European Mask and Lithography Conference : EMLC
回次:	2008 : 24th
会議開催地:	Dresden, Germany
会議開催年:	2008.01.21-2008.01.24
論文注記:	24th European Mask and Lithography Conference : EMLC2008, 21-24 January 2008, Dresden, Germany - Poster Session (6792-30)

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1 国際会議録 Radiation Hard 0.13 Micron CMOS Library at IHP U. Jagdhold ESA Communications	7 国際会議録 100 nm half-pitch double exposure KrF lithography using binary masks S. Geisler, J. Bauer, U. Haak, D. Stolarek, K. Schulz Society of Photo-optical Instrumentation Engineers
2 国際会議録 Creation of a Radiation Hard 0.13 Micron CMOS Library at IHP U. Jagdhold ESA Communications	8 国際会議録 Double exposure technology for KrF lithography S. Geisler, J. Bauer, U. Haak, D. Stolarek, K. Schulz Society of Photo-optical Instrumentation Engineers
3 国際会議録 (2.2) 1:35 - 2:05 PM - 0.13um SiGeC BiCMOS Technology (Invited) Chantre, A., Laurens, M., Chevalier, P., Monroy, A., Deleglise, F., Fellous, C., Rubaldo, L., Dutartre, D.(ST … Electrochemical Society	9 国際会議録 Characterization of optical proximity correction features Allgair,J.A., Ivy,M., Lucas,K., Sturtevant,J.L., Elliott,R.C., Mack,C.A., MacNaughton,C.W., Miller,J.D., Pochkowski,M., … SPIE-The International Society for Optical Engineering
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6 国際会議録 Trends in SiGe BiCMOS Process Integration Harame, D., Subbanna, S., Dunn, J., St Onge, S.A., Freeman, G., Malinowski, J., Groves, R., Joseph, A., Ahlgren, D., … Electrochemical Society	12 国際会議録 Halo Optimization for 0.13µm SOI CMOS Technology P.G. Agopian, J.M. Arrabaça, J.A. Martino Electrochemical Society

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