Characterizing the imaging performance of flash memory masks using AIMS

Characterizing the imaging performance of flash memory masks using AIMS

著者名:

E. van Setten ( ASML Netherlands B.V., Netherlands )
O. Wismans ( ASML Netherlands B.V., Netherlands )
K. Grim ( ASML Netherlands B.V., Netherlands )
J. Finders ( ASML Netherlands B.V., Netherlands )
M. Duso ( ASML TDC, USA )

掲載資料名:

EMLC 2008 : 24th European Mask and Lithography Conference : 21-24 January 2008, Dresden, Germany

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6792

発行年:

2008

開始ページ:

67920K-1

終了ページ:

67920K-12

総ページ数:

12

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819469564 [0819469564]

言語:

英語

請求記号:

P63600/6792

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052423
シリーズID:	PA00000029
会議名:	European Mask and Lithography Conference : EMLC
回次:	2008 : 24th
会議開催地:	Dresden, Germany
会議開催年:	2008.01.21-2008.01.24
論文注記:	24th European Mask and Lithography Conference : EMLC2008, 21-24 January 2008, Dresden, Germany - Metrology (6792-23)

類似資料:

1 国際会議録 The flash memory battle: How low can we go? E. van Setten, O. Wismans, K. Grim, J. Finders, M. Dusa Society of Photo-optical Instrumentation Engineers	7 国際会議録 Optimal proximity correction: application for flash memory design Chen,Y.G., Huang,D.L., Sung,K.T., Chiang,J.J., Yu,M., Teng,F., Chu,L., Rey,J.C., Bernard,D.A., Li,J., Moroz,V., … SPIE-The International Society for Optical Engineering
2 国際会議録 Masks for flash memory gates for the 45nm node: binary or attenuated? E. van Setten, A. Engelen, J. Finders, M. Dusa SPIE - The International Society of Optical Engineering	8 国際会議録 Image performance and mask characterization of 157-nm alternating phase-shifting mask Chen, Y.-T., Meute, J., Dean, K.R., Stark, D.R., Schilz, C.M., Dettmann, W., Koehle, R., Schiessl, B., Degel, W. SPIE-The International Society for Optical Engineering
3 国際会議録 Use of Intrawafer Photoluminescence and Chip Test Mapping to Determine the Effect of Mesa Width on Performance Levkoff, J., Palin, M.G., Grim-Bogdan, K.A. Electrochemical Society	9 国際会議録 Development of binary band-limited coronagraph masks for extremely high contrast imaging of extrasolar planets With Terrestrial Planet Finder Crepp, J., Ge, J., Debes, J. H., Kuchner, M. J. SPIE - The International Society of Optical Engineering
4 国際会議録 Imaging performance optimization for hyper-NA scanner systems in high volume production M. van de Kerkhof, E. van Setten, A. Engelen, V. Plachecki, H. Liu Society of Photo-optical Instrumentation Engineers	10 国際会議録 0.11-μm imaging in KrF lithography using dipole illumination Eurlings,M., Setten,E.van, Torres,J.A., Dusa,M.V., Socha,R.J., Capodieci,L., Finders,J. SPIE-The International Society for Optical Engineering
5 国際会議録 Evaluation of IDEALSmile for 90-nm FLASH memory contact holes imaging with ArF scanner Cantu, P., Capetti, G., Loi, S., Lupo, M., Pepe, A., Saitoh, K., Yamazoe, K., Hasegawa, Y., Iwasa, J., Toublan, O.R. SPIE - The International Society of Optical Engineering	11 国際会議録 Recent developments for high-performance staring IR imaging modules at AIM Breiter,R., Cabanski,W.A., Mauk,K.H., Rode,W., Ziegler,J., Eberhardt,E., Oelmaier,R. SPIE-The International Society for Optical Engineering
6 国際会議録 Fourier analysis of AIMS images for mask characterization Koehle, R., Dettmann, W., Verbeek, M. SPIE-The International Society for Optical Engineering	12 国際会議録 High-k Materials for Tunnel Barrier Engineering in Floating-Gate Flash Memories P. Blomme, B. Govoreanu, M. Rosmeulen, A. Akheyar, L. Haspeslagh, J. De Vos, M. Lorenzini, J. Van Houdt, K. De Meyer Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12