3D mask modeling with oblique incidence and mask corner rounding effects for the 32nm node

3D mask modeling with oblique incidence and mask corner rounding effects for the 32nm node

著者名:

M. Saied ( Freescale Semiconductor, France )
F. Foussadier ( STMicroelectronics, France )
J. Belledent ( NXP Semiconductors, France )
Y. Trouiller ( CEA/LETI, France )
I. Schanen ( IMEP, France )

掲載資料名:

Photomask technology 2007

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6730

発行年:

2007

巻:

3

開始ページ:

673050-1

終了ページ:

673050-11

総ページ数:

11

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819468871 [0819468878]

言語:

英語

請求記号:

P63600/6730

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052371
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Photomask Technology 2007
回次:	2007
会議開催地:	Monterey, California, USA
会議開催年:	2007.09.18-2007.09.21
論文注記:	Photomask technology 2007, 18-21 September 2007, Monterey, California, USA - Poster session: Advances RET (6730-184)

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2 国際会議録 OPC structures for maskshops qualification for the CMOS65nm and CMOS45nm nodes F. Sundermann, Y. Trouiller, J. Urbani, C. Couderc, J. Belledent, A. Borjon, F. Foussadier, C. Gardin, L. LeCam, Y. … SPIE - The International Society of Optical Engineering	8 国際会議録 The impact of mask topography on binary reticles at the 65nm node Word, J., Belledent, J., Trouiller, Y., Granik, Y., Toublan, O., Maurer, W. SPIE - The International Society of Optical Engineering
3 国際会議録 Three-dimensional mask effects and source polarization impact on OPC model accuracy and process window M. Saied, F. Foussadier, J. Belledent, Y. Trouiller, I. Schanen, C. Gardin, J. C. Urbani, P. K. Montgomery, F. … SPIE - The International Society of Optical Engineering	9 国際会議録 Critical failure ORC: application to the 90-nm and 65-nm nodes Belledent, J., Shang, S.D., Trouiller, Y., Miramond, C., Patterson, K., Toublan, O.R., Couderc, C., Sundermann, F., … SPIE - The International Society of Optical Engineering
4 国際会議録 Correction of long-range effects applied to the 65-nm node [5853-107] Belledent, J., Word, J., Trouiller, Y., Couderc, C., Miramond, C., Toublan, O., Chapon, J.-D., Baron, S., Borjon, A., … SPIE - The International Society of Optical Engineering	10 国際会議録 32-nm SOC printing with double patterning, regular design, and 1.2 NA immersion scanner Y. Trouiller, V. Farys, A. Borjon, J. Belledent, C. Couderc, F. Sundermann, J. Urbani, Y. Rody, C. Gardin, J. Planchot, … SPIE - The International Society of Optical Engineering
5 国際会議録 Extending immersion lithography to the 32-nm node S. Warrick, W. Conley, V. Farys, M. Benndorf, J. Gemmink, Y. Trouiller, J. Belledent, D. Jovanovic, P. Gouraud SPIE - The International Society of Optical Engineering	11 国際会議録 Modeling of electromagnetic effects from mask topography at full-chip scale Borjon, A., Belledent, J., Shang, S. D., Toublan, O., Miramond, C., Patterson, K., Lucas, K., Couderc, C., Rody, Y., … SPIE - The International Society of Optical Engineering
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