Evaluation of attenuated PSM photomask blanks with TF11 chrome and FEP-171 resist on a 248 nm DUV laser pattern generator
- 著者名:
- K. Xing ( Micronic Laser Systems AB, Sweden )
- C. Björnborg ( Micronic Laser Systems AB, Sweden )
- H. Karlsson ( Micronic Laser Systems AB, Sweden )
- A. Paulsson ( Micronic Laser Systems AB, Sweden )
- A. Rosendahl ( Micronic Laser Systems AB, Sweden )
- 掲載資料名:
- Photomask technology 2007
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6730
- 発行年:
- 2007
- 巻:
- 3
- 開始ページ:
- 67303Z-1
- 終了ページ:
- 67303Z-8
- 総ページ数:
- 8
- 出版情報:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819468871 [0819468878]
- 言語:
- 英語
- 請求記号:
- P63600/6730
- 資料種別:
- 国際会議録
類似資料:
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
6
国際会議録
Properties of a 248-nm DUV laser mask pattern generator for the 90-nm and 65-nm technology nodes
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |