Preliminary verifiability of the aerial image measurement tool over photolithography process

Preliminary verifiability of the aerial image measurement tool over photolithography process

著者名:

H. Lee ( Hynix Semiconductor Inc., South Korea )
G. Jeong ( Hynix Semiconductor Inc., South Korea )
S. Kim ( Hynix Semiconductor Inc., South Korea )
O. Han ( Hynix Semiconductor Inc., South Korea )

掲載資料名:

Photomask technology 2007

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6730

発行年:

2007

巻:

2

開始ページ:

67303A-1

終了ページ:

67303A-10

総ページ数:

10

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819468871 [0819468878]

言語:

英語

請求記号:

P63600/6730

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052371
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Photomask Technology 2007
回次:	2007
会議開催地:	Monterey, California, USA
会議開催年:	2007.09.18-2007.09.21
論文注記:	Photomask technology 2007, 18-21 September 2007, Monterey, California, USA - Session 22. Metrology II (6730-114)

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4 国際会議録 Realization of sub-80-nm small-space patterning in ArF photolithography Kim, S.-H., Kim, H.-D., Lee, S.-H., Park, C.-M., Ryoo, M.-H., Yeo, G.-S., Lee, J.-H., Cho, H.-K., Han, W.-S., Moon, … SPIE - The International Society of Optical Engineering	10 国際会議録 The Electrical Properties of Low Temperature Polycrystalline Si Thin Film Transistor Prepared by Nickel-ALD Process S. Lee, C. Lee, T. Jeong, H. Kim Electrochemical Society
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