Accuracy of mask pattern contour extraction with fine-pixel SEM images
- 著者名:
- S. Yamaguchi ( Toshiba Corp., Japan )
- E. Yamanaka ( Toshiba Corp., Japan )
- H. Mukai ( Toshiba Corp., Japan )
- T. Kotani ( Toshiba Corp., Japan )
- H. Mashita ( Toshiba Corp., Japan )
- 掲載資料名:
- Photomask technology 2007
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6730
- 発行年:
- 2007
- 巻:
- 2
- 開始ページ:
- 673036-1
- 終了ページ:
- 673036-12
- 総ページ数:
- 12
- 出版情報:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819468871 [0819468878]
- 言語:
- 英語
- 請求記号:
- P63600/6730
- 資料種別:
- 国際会議録
類似資料:
1
国際会議録
Mask pattern quality assurance based on lithography simulation with fine pixel SEM image [5992-59]
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
2
国際会議録
Fine pixel SEM image for mask pattern quality assurance based on lithography simulation [6283-48]
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
Society of Photo-optical Instrumentation Engineers |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |