Coping with double-patterning/exposure lithography by EB mask writer EBM-6000

Coping with double-patterning/exposure lithography by EB mask writer EBM-6000

著者名:

T. Kamikubo ( NuFlare Technology, Inc., Japan )
R. Nishimura ( NuFlare Technology, Inc., Japan )
K. Tsuruta ( NuFlare Technology, Inc., Japan )
K. Hattori ( NuFlare Technology, Inc., Japan )
J. Takamatsu ( NuFlare Technology, Inc., Japan )

掲載資料名:

Photomask technology 2007

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6730

発行年:

2007

巻:

2

開始ページ:

673031-1

終了ページ:

673031-9

総ページ数:

9

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819468871 [0819468878]

言語:

英語

請求記号:

P63600/6730

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052371
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Photomask Technology 2007
回次:	2007
会議開催地:	Monterey, California, USA
会議開催年:	2007.09.18-2007.09.21
論文注記:	Photomask technology 2007, 18-21 September 2007, Monterey, California, USA - Session 20. Patterning (6730-106)

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2 国際会議録 Electron-beam mask writer EBM-6000 for 45 nm HP node J. Yashima, K. Ohtoshi, N. Nakayamada, H. Anze, T. Katsumata, T. Iijima, R. Nishimura, S. Fukutome, N. Miyamoto, S. … SPIE - The International Society of Optical Engineering	8 国際会議録 Mask characterization for double patterning lithography K. Bubke, E. Cotte, J. H. Peters, R. de Kruif, M. Dusa Society of Photo-optical Instrumentation Engineers
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4 国際会議録 New electron optics for mask writer EBM-7000 to challenge hp 32nm generation T. Kamikubo, S. Golladay, R. Kendall, V. Katsap, K. Ohtoshi Society of Photo-optical Instrumentation Engineers	10 国際会議録 Wafer based mask characterization for double patterning lithography R. de Kruif, K. Bubke, G.-J. Janssen, E. van der Heijden, J. Fochler Society of Photo-optical Instrumentation Engineers
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