Wafer inspection as alternative approach to mask defect qualification

Wafer inspection as alternative approach to mask defect qualification

著者名:

C. Holfeld ( Advanced Mask Technology Ctr. GmbH & Co. KG, Germany )
F. Katzwinkel ( Qimonda Dresden GmbH & Co. OHG, Germany )
U. Seifert ( Qimonda Dresden GmbH & Co. OHG, Germany )
A. Mothes ( Advanced Mask Technology Ctr. GmbH & Co. KG, Germany )
J. H. Peters ( Advanced Mask Technology Ctr. GmbH & Co. KG, Germany )

掲載資料名:

Photomask technology 2007

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6730

発行年:

2007

巻:

2

開始ページ:

673023-1

終了ページ:

673023-9

総ページ数:

9

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819468871 [0819468878]

言語:

英語

請求記号:

P63600/6730

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052371
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Photomask Technology 2007
回次:	2007
会議開催地:	Monterey, California, USA
会議開催年:	2007.09.18-2007.09.21
論文注記:	Photomask technology 2007, 18-21 September 2007, Monterey, California, USA - Session 16. Inspection (6730-72)

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