The cleaning effects of mask aerial image after FIB repair in sub-80nm node

The cleaning effects of mask aerial image after FIB repair in sub-80nm node

著者名:

H. Lee ( Hynix Semiconductor Inc., South Korea )
G. Jeong ( Hynix Semiconductor Inc., South Korea )
S. Jeong ( Hynix Semiconductor Inc., South Korea )
S. Kim ( Hynix Semiconductor Inc., South Korea )
O. Han ( Hynix Semiconductor Inc., South Korea )

掲載資料名:

Photomask technology 2007

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6730

発行年:

2007

巻:

2

開始ページ:

673022-1

終了ページ:

673022-9

総ページ数:

9

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819468871 [0819468878]

言語:

英語

請求記号:

P63600/6730

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052371
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Photomask Technology 2007
回次:	2007
会議開催地:	Monterey, California, USA
会議開催年:	2007.09.18-2007.09.21
論文注記:	Photomask technology 2007, 18-21 September 2007, Monterey, California, USA - Session 15. Repair II (6730-71)

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1 国際会議録 Preliminary verifiability of the aerial image measurement tool over photolithography process H. Lee, G. Jeong, S. Kim, O. Han Society of Photo-optical Instrumentation Engineers	7 国際会議録 Optimum PEC conditions under resist heating effect reduction for 90-nm-node mask writing Park, E.S., Lee, J.H,, Park, D.I., Jeong, W.-G., Seo, S.K., Kim, S.-S., Choi, S.-S., Jeong, S.-H. SPIE-The International Society for Optical Engineering
2 国際会議録 Improvement of pattern collapse in sub-100 nm nodes Jung, M.-H., Lee, S.-H., Kim, H.-W., Woo, S.-G., Cho, H.-K., Han, W.-S. SPIE-The International Society for Optical Engineering	8 国際会議録 Phase-shifted assist feature OPC for sub-45-nm node optical lithography G. Yoon, H. Kim, J. Lee, S. Choi, W. Han SPIE - The International Society of Optical Engineering
3 国際会議録 The verification of printability about marginal defects and the detectability at the inspection tool in sub 50nm node H. Lee, G. Jeong, K. Seo, S. Kim, C. Kim Society of Photo-optical Instrumentation Engineers	9 国際会議録 Mask inspection method for 45nm node device S. Oh, Y. Choi, D. Hwang, G. Jeong, O. Han Society of Photo-optical Instrumentation Engineers
4 国際会議録 The study to enhance the accuracy of FIB repair on mask pattern of DRAM [6152-94] Choi, Y., Kim, H., Kim, S., Han, O. SPIE - The International Society of Optical Engineering	10 国際会議録 Realization of sub-80-nm small-space patterning in ArF photolithography Kim, S.-H., Kim, H.-D., Lee, S.-H., Park, C.-M., Ryoo, M.-H., Yeo, G.-S., Lee, J.-H., Cho, H.-K., Han, W.-S., Moon, … SPIE - The International Society of Optical Engineering
5 国際会議録 Novel cleaning techniques to achieve defect-free photomasks for sub-65-nm nodes [6349-109] Ryu, J. H., Lee, D. W., Ryu, J. S., Kim, S. P., Han, O. SPIE - The International Society of Optical Engineering	11 国際会議録 Validation of ArF chromeless PSM in the sub-100-nm node DRAM cell Lee, J.-H., Chung, D.-H., Cha, D.-C., Kim, H.-S., Park, J.-S., Nam, D.-G., Woo, S.-K., Cho, H.-S., Han, W.-S. SPIE-The International Society for Optical Engineering
6 国際会議録 Optical performance enhancement technique for 45-nm-node with binary mask J. Jung, H. Kim, J. Lee, S. Choi, W. Han SPIE - The International Society of Optical Engineering	12 国際会議録 Requirements of nano-machining repair system for 45-nm node S. -H. Lee, H. -S. Kim, H. -S. Shim, S. -Y. Lee, G. -B. Kim, H. -J. Kwon, S. -G. Woo, H. -K. Cho SPIE - The International Society of Optical Engineering

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