Pattern split rules! A feasibility study of rule based pitch decomposition for double patterning

Pattern split rules! A feasibility study of rule based pitch decomposition for double patterning

著者名:

A. van Oosten ( ASML Netherlands B.V., Netherlands )
P. Nikolsky ( ASML Netherlands B.V., Netherlands )
J. Huckabay ( Cadence Design Systems, USA )
R. Goossens ( ASML MaskTools Inc., USA )
R. Naber ( Cadence Design Systems, USA )

掲載資料名:

Photomask technology 2007

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6730

発行年:

2007

巻:

1

開始ページ:

67301L-1

終了ページ:

67301L-7

総ページ数:

7

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819468871 [0819468878]

言語:

英語

請求記号:

P63600/6730

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052371
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Photomask Technology 2007
回次:	2007
会議開催地:	Monterey, California, USA
会議開催年:	2007.09.18-2007.09.21
論文注記:	Photomask technology 2007, 18-21 September 2007, Monterey, California, USA - Session 12. Extreme NA (6730-152)

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