Study of time dependent 193 nm reticle haze

Study of time dependent 193 nm reticle haze

著者名:

J. Gordon ( Toppan Photomasks, Inc., USA )
L. Frisa ( Toppan Photomasks, Inc., USA )
C. Chovino ( Toppan Photomasks, Inc., USA )
D. Chan ( Toppan Photomasks, Inc., USA )
J. Keagy ( Toppan Photomasks, Inc., USA )

掲載資料名:

Photomask technology 2007

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6730

発行年:

2007

巻:

1

開始ページ:

67301E-1

終了ページ:

67301E-12

総ページ数:

12

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819468871 [0819468878]

言語:

英語

請求記号:

P63600/6730

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052371
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Photomask Technology 2007
回次:	2007
会議開催地:	Monterey, California, USA
会議開催年:	2007.09.18-2007.09.21
論文注記:	Photomask technology 2007, 18-21 September 2007, Monterey, California, USA - Session 11. Cleaning II (6730-49)

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1 国際会議録 Influence of environmental components on haze growth J. Gordon, D. Chan, L. E. Frisa, C. Weins, C. Chovino, J. Keagy, S. Mahoney, F. F. Chen, M. Kozuma, K. Kuroki, T. … SPIE - The International Society of Optical Engineering	7 国際会議録 Effective solution to reticle haze formation at 193nm lithography W.-J. Tseng, S.-H. Chiou, M.-C. Chiu, P.-S. Lee Society of Photo-optical Instrumentation Engineers
2 国際会議録 193-nm haze contamination: a close relationship between mask and its environment Johnstone, E., Dieu, L., Chovino, C., Reyes, J., Hong, D., Krishnan, P., Coburn, D., Capella, C. SPIE - The International Society of Optical Engineering	8 国際会議録 Polymer-platform-dependent characteristics of 193-nm photoresists Opitz, J., Allen, R. D., Breyta, G., Hofer, D. C., Sundararajan, N., Ober, C. K. SPIE - The International Society of Optical Engineering
3 国際会議録 Use of excimer laser test system for studying haze growth [5992-120] Gordon, J., Murray, B., Frisa, L. E., Nelson, E., Weins, C., Green, M., Lamantia, M. SPIE - The International Society of Optical Engineering	9 国際会議録 Analysis of adsorption effect of absorbent and threshold limit value (TLV) of Q-time for 193nm ArF reticle haze resistance F.-S. Chu, S.-H. Chiou Society of Photo-optical Instrumentation Engineers
4 国際会議録 A practical solution to the critical problem of 193 nm reticle haze D. L Halbmaier, Y. Ohyashiki, O. Kishkovich Society of Photo-optical Instrumentation Engineers	10 国際会議録 Contrarian approach to and ultimate solution for 193nm reticle haze O. Kishkovich, A. Grayfer, F. V. Belanger SPIE - The International Society of Optical Engineering
5 国際会議録 The effect of polarized 193nm irradiation on photomask haze formation Kim, Y. D., Kang, H. B., Zhang, Y., Tran, C., Farrar, N., Qin, J., Rockwell, B., Cho, H. J., Cottle, R., Chan, D., … SPIE - The International Society of Optical Engineering	11 国際会議録 Automatic defect severity scoring for 193-nm reticle defect inspection Karklin,L., Altamirano,M.M., Cai,L., Phan,K.A., Spence,C.A. SPIE-The International Society for Optical Engineering
6 国際会議録 A practical solution to the critical problem of 193 nm reticle haze O. Kishkovich, D. Halbmaier, X. Gabarre, B. Grenon, J. Lo Society of Photo-optical Instrumentation Engineers	12 国際会議録 High-resolution actinic imaging and phase metrology of 193-nm CPL reticles Merriam, A. J., Jacob, J. J., Van Den Broeke, D., Hsu, S., Chen, J. F., Kasprowicz, B. SPIE - The International Society of Optical Engineering

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