A practical solution to the critical problem of 193 nm reticle haze

A practical solution to the critical problem of 193 nm reticle haze

著者名:

O. Kishkovich ( Entegris, Inc., USA )
D. Halbmaier ( Entegris, Inc., USA )
X. Gabarre ( Entegris, Inc., USA )
B. Grenon ( Grenon Consulting Inc., USA )
J. Lo ( Entegris, Inc., USA )

掲載資料名:

Photomask technology 2007

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6730

発行年:

2007

巻:

1

開始ページ:

67301A-1

終了ページ:

67301A-11

総ページ数:

11

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819468871 [0819468878]

言語:

英語

請求記号:

P63600/6730

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052371
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Photomask Technology 2007
回次:	2007
会議開催地:	Monterey, California, USA
会議開催年:	2007.09.18-2007.09.21
論文注記:	Photomask technology 2007, 18-21 September 2007, Monterey, California, USA - Session 10. Cleaning I (6730-45)

類似資料:

1 国際会議録 A practical solution to the critical problem of 193 nm reticle haze D. L Halbmaier, Y. Ohyashiki, O. Kishkovich Society of Photo-optical Instrumentation Engineers	7 国際会議録 Evaluation of printability of crystal growth defects in a 193-nm lithography environment using AIMS Schmid, R., Zibold, A. M., Bhattacharyya, K., Chen, X., Grenon, B. J. SPIE - The International Society of Optical Engineering
2 国際会議録 Contrarian approach to and ultimate solution for 193nm reticle haze O. Kishkovich, A. Grayfer, F. V. Belanger SPIE - The International Society of Optical Engineering	8 国際会議録 High-resolution actinic imaging and phase metrology of 193-nm CPL reticles Merriam, A. J., Jacob, J. J., Van Den Broeke, D., Hsu, S., Chen, J. F., Kasprowicz, B. SPIE - The International Society of Optical Engineering
3 国際会議録 Study of time dependent 193 nm reticle haze J. Gordon, L. Frisa, C. Chovino, D. Chan, J. Keagy Society of Photo-optical Instrumentation Engineers	9 国際会議録 Reticle haze: an industrial approach S. Gough, X. Gerard, P. Bichebois, A. Roche, F. Sundermann, V. Guyader, Y. Bieron, J. Galvier, S. Nicoleau SPIE - The International Society of Optical Engineering
4 国際会議録 More on practical solutions to eliminate reticle haze and extend reticle life in the production environment: specially designed RSPs, internal POD purifiers, … W. Goodwin, M. Welch, B. Laquidara, O. Kishkovich, A. Habecker Society of Photo-optical Instrumentation Engineers	10 国際会議録 193-nm haze contamination: a close relationship between mask and its environment Johnstone, E., Dieu, L., Chovino, C., Reyes, J., Hong, D., Krishnan, P., Coburn, D., Capella, C. SPIE - The International Society of Optical Engineering
5 国際会議録 Effective solution to reticle haze formation at 193nm lithography W.-J. Tseng, S.-H. Chiou, M.-C. Chiu, P.-S. Lee Society of Photo-optical Instrumentation Engineers	11 国際会議録 Investigation of reticle defect formation at DUV lithography Bhattacharyya, K., Volk, W.W., Grenon, B.J., Brown, D., Ayala, J. SPIE-The International Society for Optical Engineering
6 国際会議録 The effect of polarized 193nm irradiation on photomask haze formation Kim, Y. D., Kang, H. B., Zhang, Y., Tran, C., Farrar, N., Qin, J., Rockwell, B., Cho, H. J., Cottle, R., Chan, D., … SPIE - The International Society of Optical Engineering	12 国際会議録 Haze detection and haze-induced process latitude variation for low-ki 193 nm lithography [6349-105] Kim, S.-J., Park, J.-B., Kim, S.H., Kang, H.-Y., Kang, Y.-M., Park, S.-W., An, I., Oh, H.-K. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12