Investigation of mask defectivity in full field EUV lithography

Investigation of mask defectivity in full field EUV lithography

著者名:

R. Jonckheere ( IMEC vzw, Belgium )
F. Iwamoto ( IMEC vzw, Belgium )
G. F. Lorusso ( IMEC vzw, Belgium )
A. M. Goethals ( IMEC vzw, Belgium )
K. Ronse ( IMEC vzw, Belgium )

掲載資料名:

Photomask technology 2007

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6730

発行年:

2007

巻:

1

開始ページ:

673012-1

終了ページ:

673012-12

総ページ数:

12

出版情報:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819468871 [0819468878]

言語:

英語

請求記号:

P63600/6730

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00052371
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Photomask Technology 2007
回次:	2007
会議開催地:	Monterey, California, USA
会議開催年:	2007.09.18-2007.09.21
論文注記:	Photomask technology 2007, 18-21 September 2007, Monterey, California, USA - Session 9. EUV and OGL (6730-37)

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2 国際会議録 EUV lithography program at IMEC A. M. Goethals, R. Jonckheere, G. F. Lorusso, J. Hermans, F. V. Roey, A. Myers, M. Chandhok, I. Kim, A. Niroomand, F. … SPIE - The International Society of Optical Engineering	8 国際会議録 An investigation of EUV lithography defectivity K. D. Cummings, T. Laursen, B. Pierson, S. Han, R. Watso Society of Photo-optical Instrumentation Engineers
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