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Litho-aware extraction for the 32nm double patterning node

著者名:
  • J. Huckabay ( Cadence Design Systems, Inc., USA )
  • Q. Chen ( Cadence Design Systems, Inc., USA )
  • C. Thayer ( Cadence Design Systems, Inc., USA )
  • R. Naber ( Cadence Design Systems, Inc., USA )
掲載資料名:
Photomask technology 2007
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6730
発行年:
2007
巻:
1
開始ページ:
67300W-1
終了ページ:
67300W-12
総ページ数:
12
出版情報:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819468871 [0819468878]
言語:
英語
請求記号:
P63600/6730
資料種別:
国際会議録

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