Comparison of TiN Thin Films Grown on SiO2 by Reactive dc Magnetron Sputtering and High Power Impulse Magnetron Sputtering
- 著者名:
- 掲載資料名:
- Materials, processes, and reliability for advanced interconnects for micro- and nanoelectronics--2011 : symposium held April 25-29, 2011, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 1335
- 発行年:
- 2012
- 開始ページ:
- 93
- 終了ページ:
- 98
- 総ページ数:
- 6
- 出版情報:
- Warrendale, PA: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781605113128 [1605113123]
- 言語:
- 英語
- 請求記号:
- M23500/1335
- 資料種別:
- 国際会議録
類似資料:
1
国際会議録
Growth of TiO₂ Thin Films on Si(001) and SiO₂ by Reactive High Power Impulse Magnetron Sputtering
Materials Research Society |
Trans Tech Publications |
Materials Research Society |
Society of Vacuum Coaters |
Society of Vacuum Coaters |
Trans Tech Publications |
Society of Vacuum Coaters |
Trans Tech Publications |
Society of Vacuum Coaters |
SPIE-The International Society for Optical Engineering |
Trans Tech Publications |
12
国際会議録
Pulsed DC Reactive Magnetron Sputtering of AlN Thin Films on High Frequency LTCC Substrates
Materials Research Society |