Blank Cover Image

Characterization of Chemical-Mechanical Polishing of Inter-Metal Dielectric Film

著者名:
S. Morimoto
R. Breivogel
R. Gasser
S. Louke
P. Moon
R. Patterson
M. Prince
さらに 2 件
掲載資料名:
Proceedings of the Symposia on Interconnects, Contact Metallization, and Multilevel Metallization and Reliability for Semiconductor Devices, Interconnects, amd Thin Insulator Materials
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
1993-25
発行年:
1993
開始ページ:
122
終了ページ:
130
総ページ数:
9
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566770675 [156677067X]
言語:
英語
請求記号:
E23400/940140
資料種別:
国際会議録

類似資料:

1 国際会議録 CHARACTERIZATION OF CHEMICAL-MECHANICAL POLISHING DIELECTRICS FOR MULTILEVEL METALLIZATION

Sun, S. C., Yeh, F. L., Tien, H. Z.

MRS - Materials Research Society
7 国際会議録 Chemical Mechanical Polishing of SiCOH-Based Low-k Dielectrics

W. Tseng, A. Sakamoto, S. Ponoth, D. Hong, L. Economikos, S. Vogt, A. Ticknor, S. Cohen, M. Krishnan, R. Wanner, B. Kim

Electrochemical Society
2 国際会議録 Characterization of the Chemical Interactions on Copper Chemical Mechanical Polishing

Lee, S.-M., Abiade, J., Choi, W., Singh, R.

Electrochemical Society
8 国際会議録 Tribological Experiments Applied to Tungsten Chemical- Mechanical Polishing

Agarwal, P., Bielmann, M., Lolt, D., Mahajan, U., Mischler, S., Rosset, E., Singh, R. K.

Materials Research Society
3 国際会議録 Material Characterization and Chemical-Mechanical Polishing of Low-Dielectric Constant Fluorinated Silicon Dioxide Films

Tseng, Wei-Tsu, Lin, Charles C.-F., Hsieh, Yuan-Tsu, Feng, M.-S.

MRS - Materials Research Society
9 国際会議録 Biased Electron Cyclotron Resonance Chemical-Vapor Deposition of Silicon Dioxide Inter-Metal Dielectric Thin Films

Shufflebotham,P., Weise,M., Pirkle,D., Denison,D.

Trans Tech Publications
4 国際会議録 Investigations of the Chemical-Mechanical Polishing of Polymer Films for ILD Applications

Neirynck, Jan M., Murarka, S. P., Gutmann, R. J.

MRS - Materials Research Society
10 国際会議録 *CHEMICAL MECHANICAL POLISHING OF INTERLEVEL DIELECTRICS: MODELS FOR REMOVAL RATE AND PLANARITY

Sivaram,. S., Tolles, R., Bath, H., Lee, E., Leggett

Materials Research Society
5 国際会議録 Study on Chemical-Mechanical Polishing of Low Dielectric Constant Polyimide Thin Films

Tai, Y.L., Tsai, M.S., Tung, I.C., Dai, B.T., Feng, M.S.

Electrochemical Society
11 国際会議録 Characterization of Defects Produced in TEOS Thin Films Due to Chemical-Mechanical Polishing (CMP)

Kaufman, F. B., Cohen, S. A., Jaso, M. A.

MRS - Materials Research Society
6 国際会議録 SURFACE LAYER FORMATION DURING THE CHEMICAL MECHANICAL POLISHING OF COPPER THIN FILMS

Steigerwald, J. M., Murarka, S. P., Duquette, D. J., Gutmann, R. J.

MRS - Materials Research Society
12 国際会議録 Metal-fill optical test structures for improved chemical mechanical polishing

AbuGhazaleh,S.A., Christie,P.

SPIE - The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12