Effect of Substrate Temperature on Hardness and Transparency of SiOC(–H) Thin Films Synthesized by Atmospheric Pressure Plasma Enhanced CVD Method

Effect of Substrate Temperature on Hardness and Transparency of SiOC(–H) Thin Films Synthesized by Atmospheric Pressure Plasma Enhanced CVD Method

著者名:

Mayui Noborisaka

掲載資料名:

Amorphous and polycrystalline thin-film silicon science and technology--2011 : symposium held April 25-29, 2011, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

1321

発行年:

2012

開始ページ:

217

終了ページ:

222

総ページ数:

6

出版情報:

Warrendale, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781605112985 [1605112984]

言語:

英語

請求記号:

M23500/1321

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00050363
シリーズID:	PA00000011
会議名:	MRS Spring Meeting
回次:	2011
会議開催地:	San Francisco, California, USA
会議開催年:	2011.04.25-2011.04.29

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