Deposition of p-Type Nanocrystalline Silicon Using High Pressure in a VHF-PECVD Single Chamber System | 東京工業大学附属図書館文献データベース

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Deposition of p-Type Nanocrystalline Silicon Using High Pressure in a VHF-PECVD Single Chamber System

著者名:

さらに 4 件

掲載資料名:

Amorphous and polycrystalline thin-film silicon science and technology--2011 : symposium held April 25-29, 2011, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

1321

発行年:

2012

開始ページ:

393

終了ページ:

398

総ページ数:

6

出版情報:

Warrendale, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781605112985 [1605112984]

言語:

英語

請求記号:

M23500/1321

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00050363
シリーズID:	PA00000011
会議名:	MRS Spring Meeting
回次:	2011
会議開催地:	San Francisco, California, USA
会議開催年:	2011.04.25-2011.04.29

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