High Rate Deposition of Cluster-Suppressed Amorphous Silicon Films Deposited Using a Multi-Hollow Discharge Plasma CVD

High Rate Deposition of Cluster-Suppressed Amorphous Silicon Films Deposited Using a Multi-Hollow Discharge Plasma CVD

著者名:

掲載資料名:

Photovoltaic materials and manufacturing issues II : symposium held November 29-December 3, Boston, Massachusetts, U.S.A

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

1210

発行年:

2010

開始ページ:

217

終了ページ:

222

総ページ数:

6

出版情報:

Warrendale, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781605111834 [160511183X]

言語:

英語

請求記号:

M23500/1210

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00050324
シリーズID:	PA00000011
会議名:	MRS Fall Meeting
回次:	2009
会議開催地:	Boston, Massachusetts, U.S.A.
会議開催年:	2009.11.29-2009.12.03

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