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Inductively coupled plasma reactive ion etching of Co₂MnSi magnetic films for magnetic random access memory

著者名:
掲載資料名:
New developments and application in chemical reaction engineering : proceedings of the 4th Asia-Pacific Chemical Reaction Engineering Symposium (APCRE '05) : Gyeongju, Korea, June 12-15, 2005
シリーズ名:
Studies in surface science and catalysis
シリーズ巻号:
159
発行年:
2006
開始ページ:
377
終了ページ:
380
総ページ数:
4
出版情報:
Amsterdam: Elsevier
ISSN:
01672991
ISBN:
9780444517333 [0444517332]
言語:
英語
請求記号:
S76950
資料種別:
国際会議録

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