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Electronic Transport Properties of Cu/MnOx/SiO₂/p-Si MOS Devices

著者名:
掲載資料名:
Materials, processes, and reliability for advanced interconnects for micro- and nanoelectronics--2009 : symposium held April 14-17, 2009, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
1156
発行年:
2009
開始ページ:
105
終了ページ:
112
総ページ数:
8
出版情報:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781605111292 [1605111295]
言語:
英語
請求記号:
M23500/1156
資料種別:
国際会議録

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