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Comparison of Mid Frequency and Bipolar Pulsed DC Power Supplies for Dual Magnetron Sputtering

著者名:
  • D. Ochs ( HÜTTINGER Elektronik GmbH + Co. KG, Freiburg, Germany )
  • P. Ozimek ( HÜTTINGER Electronic Sp. z o.o., Zielonka, Poland )
  • A. Klimczak ( HÜTTINGER Electronic Sp. z o.o., Zielonka, Poland )
  • T. Rettich ( HÜTTINGER Elektronik GmbH + Co. KG, Freiburg, Germany )
掲載資料名:
51st annual technical conference proceedings, April 19-24, 2008, Chicagom, IL
シリーズ名:
Annual Technical Conference of Society of Vacuum Coaters
シリーズ巻号:
51
発行年:
2008
開始ページ:
366
終了ページ:
369
総ページ数:
4
出版情報:
Albuquerque, NM: Society of Vacuum Coaters
ISSN:
07375921
言語:
英語
請求記号:
A63930/51
資料種別:
国際会議録

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