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Atmospheric Pressure Plasmas for Crystalline Silicon Photovoltaics

著者名:
  • V. Hopfe ( Fraunhofer Institut für Werkstoff- und Strahltechnik (IWS), Dresden, Germany )
  • D.W. Sheel ( CVD Technologies Ltd., Manchester, United Kingdom )
  • R. Moeller ( Centrotherm Photovoltaics GmbH & Co. KG, Blaubeuren, Germany )
掲載資料名:
51st annual technical conference proceedings, April 19-24, 2008, Chicagom, IL
シリーズ名:
Annual Technical Conference of Society of Vacuum Coaters
シリーズ巻号:
51
発行年:
2008
開始ページ:
123
終了ページ:
133
総ページ数:
11
出版情報:
Albuquerque, NM: Society of Vacuum Coaters
ISSN:
07375921
言語:
英語
請求記号:
A63930/51
資料種別:
国際会議録

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