Internal ICP Assisted Magnetron Sputtering for Fast Deposition at Low Pressure (10⁻⁴ mbar range) in Semi Industrial Coating Chamber (0.1 ㎥)
- 著者名:
- C. Nouvellon ( Materia Nova, Mons, Belgium )
- J.P. Dauchot ( Materia Nova, Mons, Belgium )
- Y. Paint ( Materia Nova, Mons, Belgium )
- F. Monteverde ( Materia Nova, Mons, Belgium )
- M. Hecq ( Materia Nova, Mons, Belgium )
- 掲載資料名:
- 47th annual technical conference proceedings, April 24-29, 2004, Dallas, Texas
- シリーズ名:
- Annual Technical Conference of Society of Vacuum Coaters
- シリーズ巻号:
- 47
- 発行年:
- 2004
- 開始ページ:
- 146
- 終了ページ:
- 149
- 総ページ数:
- 4
- 出版情報:
- Albuquerque, NM: Society of Vacuum Coaters
- ISSN:
- 07375921
- 言語:
- 英語
- 請求記号:
- A63930/47
- 資料種別:
- 国際会議録
類似資料:
Society of Vacuum Coaters |
SPIE-The International Society for Optical Engineering |
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Society of Vacuum Coaters |
Society of Vacuum Coaters |
SPIE - The International Society of Optical Engineering |
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SPIE-The International Society for Optical Engineering |
Kluwer Academic Publishers | |
Trans Tech Publications |
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