Internal ICP Assisted Magnetron Sputtering for Fast Deposition at Low Pressure (10⁻⁴ mbar range) in Semi Industrial Coating Chamber (0.1 ㎥)

Internal ICP Assisted Magnetron Sputtering for Fast Deposition at Low Pressure (10⁻⁴ mbar range) in Semi Industrial Coating Chamber (0.1 ㎥)

著者名:

C. Nouvellon ( Materia Nova, Mons, Belgium )
J.P. Dauchot ( Materia Nova, Mons, Belgium )
Y. Paint ( Materia Nova, Mons, Belgium )
F. Monteverde ( Materia Nova, Mons, Belgium )
M. Hecq ( Materia Nova, Mons, Belgium )

掲載資料名:

47th annual technical conference proceedings, April 24-29, 2004, Dallas, Texas

シリーズ名:

Annual Technical Conference of Society of Vacuum Coaters

シリーズ巻号:

47

発行年:

2004

開始ページ:

146

終了ページ:

149

総ページ数:

4

出版情報:

Albuquerque, NM: Society of Vacuum Coaters

ISSN:

07375921

言語:

英語

請求記号:

A63930/47

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00049385
シリーズID:	PA00000013
会議名:	Society of Vacuum Coaters. Annual technical conference
回次:	2004 : 47th
会議開催地:	Dallas, Texas USA
会議開催年:	2004.04.24-2004.04.29

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