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Effect of Elevated Implant Temperature on Amorphization and Activation in As-implanted Silicon-on-insulator Layers

著者名:
Katherine L. Saenger
Stephen W. Bedell
Matthew Copel
Amlan Majumdar
John A. Ott
Joel P. de Souza
Steven J. Koester
Donald R. Wall
Devendra K. Sadana
さらに 4 件
掲載資料名:
Doping engineering for front-end processing : symposium held March 25-27, 2008, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
1070
発行年:
2008
開始ページ:
205
終了ページ:
210
総ページ数:
6
出版情報:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781605110400 [160511040X]
言語:
英語
請求記号:
M23500/1070
資料種別:
国際会議録

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