Low Temperature Synthesis of Nanocrystalline Silicon and Silicon Oxide Films by Plasma Chemical Vapor Deposition

Low Temperature Synthesis of Nanocrystalline Silicon and Silicon Oxide Films by Plasma Chemical Vapor Deposition

著者名:

Atsushi Tomyo

掲載資料名:

Amorphous and polycrystalline thin-film silicon science and technology--2008 : symposium held March 25-28, 2008, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

1066

発行年:

2008

開始ページ:

167

終了ページ:

172

総ページ数:

6

出版情報:

Warrendale, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781605110363 [1605110361]

言語:

英語

請求記号:

M23500/1066

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00049370
シリーズID:	PA00000011
会議名:	Materials Research Society meeting ; Symposium on amorphous and polycrystalline thin-film silicon science and technology
回次:	2008
会議開催地:	San Francisco, California, U.S.A.
会議開催年:	2008.05.25-2008.05.28

類似資料:

1 国際会議録 Helicon wave plasma chemical vapor deposition of nanocrystalline silicon carbide films at low substrate temperature Yu, W., Lu, W., Wang, B., Han, L., Fu, G. SPIE - The International Society of Optical Engineering	7 国際会議録 Silicon Nanowires Obtained by Low Temperature Plasma-based Chemical Vapor Deposition. R.A. Puglisi, G. Mannino, S. Scalese, A. La Magna, V. Privitera Materials Research Society
2 国際会議録 Low Temperature (75℃) Hydrogenated Nanocrystalline Silicon Films Grown by Conventional Plasma Enhanced Chemical Vapor Deposition for Thin Film Transistors Lee, Czang-Ho, Sazonov, Andrei, Nathan, Arokia Materials Research Society	8 国際会議録 Influence Of The Beam Irradiation Condition With Oblique Incidence On Crystallization Of A Silicon Film By A Linearly Polarized Pulse Laser Nakata, Yasunori, Kaki, Hirokazu, Horita, Susumu Materials Research Society
3 国際会議録 DEPOSITION OF TITANIUM OXIDE FILMS FROM METAL-ORGANIC PRECURSOR BY ELECTRON CYCLOTRON RESONANCE PLASMA-ASSISTED CHEMICAL VAPOR DEPOSITION Nagahori, Atsushi, Raj, Rishi MRS - Materials Research Society	9 国際会議録 Nanocrystalline Silicon Films Grown at High Pressure in Very High Frequency Plasma Enhanced Chemical Vapor Deposition System Y.Q. Guo, R. Huang, J. Song, X. Wang, Y.X. Zhang Trans Tech Publications
4 国際会議録 Development of low temperature silicon nitride and silicon dioxide films by inductively-coupled plasma chemical vapor deposition Lee, J.W., Mackenzie, K.D., Johnson, D., Pearton, S.J., Ren, F., Sasserath, J.N. Materials Research Society	10 国際会議録 Nanocrystalline SiC films deposited at low temperature using hot filament chemical vapor deposition Yu, W., Zheng, Z.Y., Han, L., Fu, G.S. SPIE-The International Society for Optical Engineering
5 国際会議録 Growth of Polycrystalline Silicon Films at Low Temperature by Plasma Enhanced Chemical Vapor Deposition Hatanaka, Y., Jayatissa, A. H., Ishikawa, K., Nakanishi, Y. MRS - Materials Research Society	11 国際会議録 ZnO Thin Film Transistors Fabricated by Atomic Layer Deposition Method Yumi Kawamura, Nozomu Hattori, Naomasa Miyatake, Kazutoshi Murata, Yukiharu Uraoka Materials Research Society
6 国際会議録 Low Temperature Epitaxy of n-Doped Silicon Thin Films Using Plasma Enhanced Chemical Vapor Deposition Mahdi Farrokh Baroughi, Hassan G. El-Gohary, Cherry Y. Cheng, Siva Sivoththaman Materials Research Society	12 国際会議録 Investigation of Nanocrystalline Diamond Films Prepared by Microwave Plasma Chemical Vapor Deposition Popov, C., Kulisch, W. Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12