Effective Capture Cross-Sections of Traps in High-k Gate Dielectrics
- 著者名:
- 掲載資料名:
- Advanced gate stack, source/drain and channel engineering for Si-based CMOS 3 : new materials, processes and equipment
- シリーズ名:
- ECS transactions
- シリーズ巻号:
- 6(1)
- 発行年:
- 2007
- 開始ページ:
- 229
- 終了ページ:
- 238
- 総ページ数:
- 10
- 出版情報:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 19385862
- ISBN:
- 9781566775502 [1566775507]
- 言語:
- 英語
- 請求記号:
- E23400/6-1
- 資料種別:
- 国際会議録
類似資料:
Electrochemical Society |
SPIE-The International Society for Optical Engineering |
MRS-Materials Research Society |
8
国際会議録
Ge nanocrystals embedded in Hf-aluminate high-k gate dielectric for floating gate memory application
SPIE - The International Society of Optical Engineering |
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
MRS-Materials Research Society |
Trans Tech Publications |
Electrochemical Society |
Materials Research Society |
SPIE - The International Society for Optical Engineering |