Hydrogen Gettering and Platelet Formation in Implanted and Hydrogenated Silicon

Hydrogen Gettering and Platelet Formation in Implanted and Hydrogenated Silicon

著者名:

A. Job

掲載資料名:

High purity silicon 9

シリーズ名:

ECS transactions

シリーズ巻号:

3(4)

発行年:

2006

開始ページ:

147

終了ページ:

158

総ページ数:

12

出版情報:

Pennington, N.J.: Electrochemical Society

ISSN:

19385862

ISBN:

9781566775045 [1566775043]

言語:

英語

請求記号:

E23400/3-4

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00047112
シリーズID:	PA00000034
会議名:	International Symposium on High Purity Silicon ; Meeting of the Electrochemical Society
回次:	2006 ; 210th
会議開催地:	Cancun, Mexico
会議開催年:	2006.10.29-2006.11.03

類似資料:

1 国際会議録 Void Formation in Hydrogen Implanted and Subsequently Plasma Hydrogenated and Annealed Czochralski Silicon Job, R., Dungen, W., Ma, Y., Huang, Y.L., Horstmann, J.T. Materials Research Society	7 国際会議録 Micro-Raman Analysis of Hydrogen Related Defects in Czochralski Silicon (Invited) Job, R., Dungen, W., Ma, Y., Huang, Y. L. Electrochemical Society
2 国際会議録 μ-Raman Spectra Analysis of the Evolution of Hydrogen Related Defects and Void Formation in the Silicon Ion-Cut Process Dungen, W., Job, R., Ma, Y., Huang, Y.L., Fahrner, W.R., Keller, L.O., Horstmann, J.T. Materials Research Society	8 国際会議録 On the Formation Kinetics of Thin Nanopatterned Layers on Silicon Wafers Created by Hydrogen Plasma Exposure Job, R., Huang, Y. L., Ma, Y., Zolgert, B., Dungen, W. Materials Research Society
3 国際会議録 From Smart-Cut to Soft-Cut: Mechanisms of Hydrogen Plasma Supported Layer Exfoliation in Silicon R. Job, W. Düngen, Y. Ma, J. T. Horstmann Electrochemical Society	9 国際会議録 Control of Stress in Surface Engineered Silicon Ma, Y., Job, R., Zolgert, B., Dungen, W., Huang, Y. L., Fahrner, W. R. Materials Research Society
4 国際会議録 P-N Junction Diodes Fabricated Based on Donor Formation in Plasma Hydrogenated P-Type Czochralski Silicon Huang, Y.L., Simoen, E., Job, R., Claeys, C., Dungen, W., Ma, Y., Fahrner, W.R., Versluys, J., Clauws, P. Materials Research Society	10 国際会議録 Comparative Raman And Tem Analysis Of The Evolution Of Platelet Defects In Plasma Hydrogenated And Annealed Czochralski Silicon Job, R., Beaufort, M.-F., Barbot, J.-F., Ulyashin, A.G., Fahrner, W.R. Materials Research Society
5 国際会議録 Oxygen Gettering and Thermal Donor Formation at Postimplantation Annealing of Hydrogen-Implanted Czochralski Silicon Ulyashin, A. G., Bumay, Yu. A., Fahrner, W. R., Ivanov, A. I., Job, R., Palmetshofer, L. MRS - Materials Research Society	11 国際会議録 Thermal Evolution of Hydrogen Related Defects in Silicon Investigated by u-Raman Spectroscopy Ma, Y., Huang, Y.L., Job, R., Fahrner, W.R., Beaufort, M.-F., Barbot, J. -F. Electrochemical Society
6 国際会議録 Comparison of Oxygen and Hydrogen Gettering at High-Temperature Postimplantation Annealing of Hydrogen- and Helium-Implanted Czochralski Silicon Job, R., Fahrner, W. R., Ivanov, A. I., Palmetshofer, L., Ulyashin, A. G. MRS - Materials Research Society	12 国際会議録 Formation and Annihilation of Hydrogen Related Donor States in Proton Implanted and Subsequently Plasma Hydrogenated N-Type Float Zone Silicon R. Job, F. Niedernostheide, H. Schulze Electrochemical Society

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