Enhanced Dielectric Constant of HfO₂ and Al₂O₃ Thin-Films with Silver Nanoparticles
- 著者名:
K. Ravindran M. Othman M. Yun N. Biswas N. Mehta S. Guha K. Gangopadhyay S. Gangopadhyay - 掲載資料名:
- Physics and technology of high-k gate dielectrics 4
- シリーズ名:
- ECS transactions
- シリーズ巻号:
- 3(3)
- 発行年:
- 2006
- 開始ページ:
- 535
- 終了ページ:
- 544
- 総ページ数:
- 10
- 出版情報:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 19385862
- ISBN:
- 9781566775038 [1566775035]
- 言語:
- 英語
- 請求記号:
- E23400/3-3
- 資料種別:
- 国際会議録
類似資料:
MRS - Materials Research Society |
Electrochemical Society |
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SPIE-The International Society for Optical Engineering |
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Electrochemical Society |
6
国際会議録
Analysis of Dielectric Constants to Determine sp3/sp2 Ratio in Hydrogenated Amorphous Carbon Films
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