Laminated CeO₂/HfO₂ High-K Gate Dielectrics Grown by Pulsed Laser Deposition in Reducing Ambient | 東京工業大学附属図書館文献データベース

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Laminated CeO₂/HfO₂ High-K Gate Dielectrics Grown by Pulsed Laser Deposition in Reducing Ambient

著者名:

さらに 4 件

掲載資料名:

Physics and technology of high-k gate dielectrics 4

シリーズ名:

ECS transactions

シリーズ巻号:

3(3)

発行年:

2006

開始ページ:

521

終了ページ:

534

総ページ数:

14

出版情報:

Pennington, N.J.: Electrochemical Society

ISSN:

19385862

ISBN:

9781566775038 [1566775035]

言語:

英語

請求記号:

E23400/3-3

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00047111
シリーズID:	PA00000034
会議名:	International Symposium on High Dielectric Constant Gate Stacks ; Meeting of the Electrochemical Society
回次:	4th ; 210th
会議開催地:	Cancun, Mexico
会議開催年:	2006.10.30-2006.11.03

類似資料:

1 国際会議録 39 Characterization of Laminated CeO2-HfO2 High-k Gate Dielectrics Deposited by Pulsed Laser Deposition Karakaya, K., Zinine, A., van Berkum, J.G.M., Croat, P., Verheijen, M.A., Rittersma, Z.M., Rijnders, G., Blank, D.H.A. Electrochemical Society	7 国際会議録 The Influence of NH₃ Anneal on the Crystallization Kinetics of HfO₂ Gate Dielectric Films P. Lysaght, J. Bornett, J. Woicik, B. Foran, G. Bersuker, B. Lee Electrochemical Society
2 国際会議録 Atomic Vapor Deposition (AVDTM) process for High Performance HfO2 Dielectric Layers Cosnier, V., Dabertrand, K., Blonkowski, S., Lhostis, S., Zoll, S., Morand, Y., Descombes, S., Guillaumot, B., Hobbs, … Materials Research Society	8 国際会議録 Flicker noise characteristics of MOSFETs with HfO2, HfAlOx, and Al2O3/HfO2 gate dielectrics Devireddy, S. P., Min, B., Celik-Butler, Z., Wang, F., Zlotnicka, A., Tseng, H. -H., Tobin, P. J. SPIE - The International Society of Optical Engineering
3 国際会議録 55 Germanium-on-Si MOSFETS with HfO2 Gate Dielectric Donnelly, J. P., Chen, J., Joshi, S., Kelly, D. Q., Ahmad, D., Dey, S., Guha, S., Banerjee, S. K. (Invited Paper) Electrochemical Society	9 国際会議録 Dielectric Susceptibility and Strain in Sr1-xBaxTiO3 Ferroelectric Thin Films Grown by Pulsed Laser Deposition Knauss, L. A., Horwitz, J. S., Chrisey, D. B., Pond, J. M., Grabowski, K. S., Qadri, S. B., Donovan, E. P., Mueller, C. … MRS - Materials Research Society
4 国際会議録 * High-K Gate Dielectrics: HfO 2, ZrO 2, and Their Silicates Nieh, R., Onishi, K., Choi, R., Dharmarajan, E., Gopalan, S., Kang, C.S., Lee, J.C. Electrochemical Society	10 国際会議録 Growth Kinetics During Pulsed Laser Deposition of Complex Oxide Thin Films G. Rijnders, G. Koster, D.H.A. Blank Electrochemical Society
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