Laser Spike Annealing of Strained Si/ Strained Si0.3GeO.7/ Relaxed SiO.7GeO.3 Dual Channel High Mobility p-MOSFETs
- 著者名:
C. Ni Chleirigh X. Wang G. Rimple Y. Wang M. Canonico D. D. Theodore O. Olubuyide J. L. Hoyt - 掲載資料名:
- Advanced gate stack, source/drain and channel engineering for Si-based CMOS 2: new materials, processes, and equipment
- シリーズ名:
- ECS transactions
- シリーズ巻号:
- 3(2)
- 発行年:
- 2006
- 開始ページ:
- 355
- 終了ページ:
- 362
- 総ページ数:
- 8
- 出版情報:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 19385862
- ISBN:
- 9781566775021 [1566775027]
- 言語:
- 英語
- 請求記号:
- E23400/3-2
- 資料種別:
- 国際会議録
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