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The Low Leakage Current Density of MIS with SiO₂ Film Made by ICP-CVD

著者名:
掲載資料名:
Dielectrics for nanosystems II: materials science, processing, reliability, and manufacturing
シリーズ名:
ECS transactions
シリーズ巻号:
2(1)
発行年:
2006
開始ページ:
261
終了ページ:
266
総ページ数:
6
出版情報:
Pennington, N.J.: Electrochemical Society
ISSN:
19385862
ISBN:
9781566774383 [1566774381]
言語:
英語
請求記号:
E23400/2-1
資料種別:
国際会議録

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