Blank Cover Image

An Easy Method to Measure the Damaged Thickness of Low-k Film after Ash Process

著者名:
C. Shim
H. Lim
S. Jung
I. Shin
K. Park
J. Whang
H. Lee
J. Kim
J. Han
K. Kim
さらに 5 件
掲載資料名:
Dielectrics for nanosystems II: materials science, processing, reliability, and manufacturing
シリーズ名:
ECS transactions
シリーズ巻号:
2(1)
発行年:
2006
開始ページ:
243
終了ページ:
254
総ページ数:
12
出版情報:
Pennington, N.J.: Electrochemical Society
ISSN:
19385862
ISBN:
9781566774383 [1566774381]
言語:
英語
請求記号:
E23400/2-1
資料種別:
国際会議録

類似資料:

1 国際会議録 Mask CD correction method using dry-etch process [6349-li]

Jung, H. Y., Ha, T. J., Shin, J. C., Jeong, K. C., Kim, Y. K., Han, O.

SPIE - The International Society of Optical Engineering
7 国際会議録 Optimum Design of a Pilger Mill Process for Wire Forming Using CAD/CAE

Park, H. J., Kim, S. S., Lee, S., Choi, T. H., Lee, H. W., Lim, S. J., Kim, E. Z., Na, K. H., Han, C. S.

Trans Tech Publications
2 国際会議録 Polyimide Surface Modification by Low Energy Ion Beam Irradiation

Lee, W. J., Lee, Y. S., Rha, S. K., Lim, K. Y., Lee, H. S., Whang, C. N.

Trans Tech Publications
8 国際会議録 Enhancement of Adhesion Between Cu Thin Film and Polyimide Modified by Ion Assisted Reaction

Choi, S. C., Kim, K. H., Jung, H-J., Whang, C. N., Koh, S. K.

MRS - Materials Research Society
3 国際会議録 Enhanced Adhesion of Cu Film on a Low-k Material by Using Ti Glue Layer, B Dopant and NU2 Plasma Treatment

Ko, Y. K., Lee, S., Yang, H. J., Shim, C., Jung, D., Lee, J. G.

Materials Research Society
9 国際会議録 Develop process optimization for CD uniformity improvement

Shin,J.-C., Won,J.-I., Jung,H.-Y., Kim,M.-S., Choi,Y.-K., Han,O.

SPIE-The International Society for Optical Engineering
4 国際会議録 Copper Diffusion and Corrosion Behavior Through the Hillock Defect Found Beneath the Weak SiN Dielectric Barrier in Dual Damascene Process

S. Kim, C. Shim, J. Hong, H. Lee, J. Han, K. Kim, Y. Kim

Electrochemical Society
10 国際会議録 XPS AND FTIR STUDY OF THE THIN POLYIMIDE FILMS FABRICATED BY IONIZED CLUSTER BEAM DEPOSITION

Kim, K. W., Chae, K. H., Choi, S. C., Cho, S. J., Vahe, Y. W., Whang, C. N., Jung, H. J., Lee, D. H., Lee, J. K.

Materials Research Society
5 国際会議録 Aberration sensitivity control for the isolation layer in low-k1 DRAM process

Cho, B.-H., Yim, D., Park, C.-H., Lee, S.-H., Yang, H.-J., Choi, J.-H., Shin, Y.-C., Kim, C.-D., Choi, J.-S., Kang, …

SPIE-The International Society for Optical Engineering
11 国際会議録 Piecewise approach of maximum-likelihood receiver

Kim,K.H., Shim,J.S., Park,H.S., Jung,K.H., Shin,D.-H.

SPIE-The International Society for Optical Engineering
6 国際会議録 A study of tension control in looperless hot rolling process using SVR [6042-35]

Kim J. D, Shim J. H, Han D. C, Park C. J, Park D. C, Lee S. G

SPIE - The International Society of Optical Engineering
12 国際会議録 Amine gradient process for 157-nm lithography

Jung, J.-C., Kong, K.-K., Hwang, Y.-S., Park, K.-D., Lee, S.-K., Lee, G.S., Kim, J.S., Shin, K.-S.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12