Threshold Voltage Control in PMOSFETs with Polysilicon or Fully-Silicided Gates on Hf-Based Gate Dielectric Using Controlled Lateral Oxidation | 東京工業大学附属図書館文献データベース

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Threshold Voltage Control in PMOSFETs with Polysilicon or Fully-Silicided Gates on Hf-Based Gate Dielectric Using Controlled Lateral Oxidation

著者名:

S. Van Elshocht

さらに 8 件

掲載資料名:

Physics and technology of high-k gate dielectrics III

シリーズ名:

ECS transactions

シリーズ巻号:

1(5)

発行年:

2006

開始ページ:

305

終了ページ:

312

総ページ数:

8

出版情報:

Pennington, N.J.: Electrochemical Society

ISSN:

19385862

ISBN:

9781566774444 [1566774446]

言語:

英語

請求記号:

E23400/1-5

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00047099
シリーズID:	PA00000034
会議名:	International Symposium on High Dielectric Constant Materials: Materials Science, Processing, Reliability, and Manufacturing Issues
回次:	3rd
会議開催地:	Los Angeles, California, USA
会議開催年:	2005.10.16-2005.10.21

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1 国際会議録 Compatibility of Polysilicon with HfO2-based Gate Dielectrics for CMOS Applications Kaushik, V., De Gendt, S., Caymax, M., Young, E., Rohr, E., Van Elshocht, S., Delabie, A., Claes, M., Shi, X., Chen, I., … Electrochemical Society	7 国際会議録 INTEGRATION OF HIGH-k GATE DIELECTRICS - WET ETCH CLEANING AND SURFACE CONDITIONING De Gendt, S., Beckx, S., Caymax, M., Claes, M., Conard, T., Delabie, A., Deweerd, W., Hellin, D., Kraus, H., Onsia, B., … Electrochemical Society
2 国際会議録 The Influence of Defects on Compatibility and Yield of the HfO2-PolySilicon Gate Stack for CMOS Integration Kaushik, V.S., Gendt, S.De, Carter, R., Claes, M., Rohr, E., Pantisano, L., Kluth, J., Kerber, A., Cosnier, V., Cartier, … Materials Research Society	8 国際会議録 13 High-k Gate Stack Engineering - towards Meeting Low Standby Power and High Performance Targets De Gendt, S., Brunco, D., Caymax, M., Canard, T., Date, L., Delabie, A., Deweerd, W., Groeseneken, G., Houssa, M., Hyun, … Electrochemical Society
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4 国際会議録 Scalability of MOCVD-Deposited Hafnium Oxide Elshocht, S. Van, Carter, R., Caymax, M., Claes, M., Conard, T., Date, L., Gendt, S. De, Kaushik, V., Kerber, A., Kluth, … Materials Research Society	10 国際会議録 OZONATED HF APPLICATIONS IN A SPRAY PROCESSING Claes, M., Rohr, E., De Gendt, S., Lagrange, S., Bergman, E., Heyns, M. Electrochemical Society
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