SURFACE ROUGHNESS IN SILICON CARBIDE TECHNOLOGY | 東京科学大学図書館文献データベース

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SURFACE ROUGHNESS IN SILICON CARBIDE TECHNOLOGY

著者名:

K. Shanmugasundaram

さらに 4 件

掲載資料名:

Cleaning Technology in Semiconductor Device Manufacturing IX

シリーズ名:

ECS transactions

シリーズ巻号:

1(3)

発行年:

2006

開始ページ:

228

終了ページ:

233

総ページ数:

6

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

19385862

ISBN:

9781566774291 [1566774292]

言語:

英語

請求記号:

E23400/1-3

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00047097
シリーズID:	PA00000034
会議名:	International Symposium on Cleaning Technology in Semiconductor Device Manufacturing ; Fall Meeting of the Electrochemical Society
回次:	9th ; 2005
会議開催地:	Los Angeles, California, USA
会議開催年:	2005.10.00

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1 国際会議録 EFFECT OF RIE SEQUENCE AND POST-RIE SURFACE PROCESSING ON THE RELIABILITY OF GATE OXIDE lN A TRENCH Grebs, T., Ridley, R., Chang, K., Wu, C.-T., Agarwal, R., Mytych, J., Dimachkie, W., Dolny, G., Michalowicz, J., … Electrochemical Society	7 国際会議録 Mist Deposition for TFT Technology K. Shanmugasundaram, S. Price, K. Chang, D. Lee, J. Ruzyllo Electrochemical Society
2 国際会議録 THICKNESS DEPENDENT SENSITIVITY OF GATE OXIDES TO SURFACE CONTAMINATION Ridley, R., Wu, C.-T., Roman, P., Dolny, G., Grebs, T., Stensney, F., Ruzyllo, J. Electrochemical Society	8 国際会議録 Design of Silicon Carbide Devices to Minimize the Impact of Variation of Epitaxial Parameters R. Radhakrishnan, T. Witt, S. Lee, R. Woodin Trans Tech Publications
3 国際会議録 EFFECT OF SILICON SURFACE CONDITION ON FILM FORMATION USING MIST DEPOSITION K. Shanmugasundaram, K. Chang, J. Ruzyllo Electrochemical Society	9 国際会議録 Processing of Thick Thermal Gate Oxides in Trenchs Wu, C.T., Ridley, R., Dolny, G., Grebs, T., Hao, J., Suliman, S., Venkataraman, B., Awadelkarim, O., Williams, R., … Electrochemical Society
4 国際会議録 Increase of SiC Substrate Resistance Induced by Annealing T.L. Straubinger, R.L. Woodin, T. Witt, J. Shovlin, G.M. Dolny Trans Tech Publications	10 国際会議録 The Effect of Carbon in Silicon on Oxidation Kinetics and Silicon Dioxide Integrity Ridley, R.S., Brozek, T., Ruzyllo, J. Electrochemical Society
5 国際会議録 The Impact of Schottky Barrier Tunneling on SiC-JBS Performance G.M. Dolny, R.L. Woodin, T. Witt, J. Shovlin Trans Tech Publications	11 国際会議録 Semiconductor Surface Cleaning and Conditioning Challenges Beyond Planar Silicon Technology J. Ruzyllo Electrochemical Society
6 国際会議録 REVERSING OF SILICON SURFACE AGING BY LAMP CLEANING Shanmugasundaram, K., Chang, K., Shallenberger, J., Danel, A., Tardif, F., Ruzyllo, J. Electrochemical Society	12 国際会議録 STUDY OF THE EFFECT OF SILICON SURFCE TREATMENT ON EOT IN HIGH-k DIELECTRIC MOS GATE STACK Chang, K., Shanmugasundaram, K., Lee, D.-O., Roman, P., Shallenberger, J., Chang, F.-M., Wang, J., Beck, R., Mumbauer, … Electrochemical Society

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