AIR FLOW IN A SQUARE QUARTZ PLATE SPIN CLEANER

AIR FLOW IN A SQUARE QUARTZ PLATE SPIN CLEANER

著者名:

H. Habuka

掲載資料名:

Cleaning Technology in Semiconductor Device Manufacturing IX

シリーズ名:

ECS transactions

シリーズ巻号:

1(3)

発行年:

2006

開始ページ:

187

終了ページ:

193

総ページ数:

7

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

19385862

ISBN:

9781566774291 [1566774292]

言語:

英語

請求記号:

E23400/1-3

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00047097
シリーズID:	PA00000034
会議名:	International Symposium on Cleaning Technology in Semiconductor Device Manufacturing ; Fall Meeting of the Electrochemical Society
回次:	9th ; 2005
会議開催地:	Los Angeles, California, USA
会議開催年:	2005.10.00

類似資料:

1 国際会議録 Influence of Gas Velocity and Humidity on Diethyl Phthalate Adsorption and Desorption on Silicon Surface H. Habuka, M. Tawada, K. Suzuki, T. Takeuchi, M. Aihara Electrochemical Society	7 国際会議録 Density and Behavior of Etch Pits on C-Face 4H-SiC Surface Produced by CIF₃ Gas H. Habuka, K. Furukawa, T. Kanai, T. Kato Trans Tech Publications
2 国際会議録 Formation Mechanism of Local Thickness Profile of Silicon Epitaxial Film Habuka, H., Fukaya, S., Sawada, A., Takeuchi, T., Aihara, M. Electrochemical Society	8 国際会議録 Density of Etch Pits on C-Face 4H-SiC Surface Produced by ClF₃ Gas H. Habuka, K. Furukawa, T. Kanai, T. Kato Trans Tech Publications
3 国際会議録 STUDY OF THE CLEANING CONTROL USING A MEGAHERTZ NOZZLE SOUND PRESSURE MONITOR SYSTEM FOR SINGLE-PLATE SPIN CLEANERS Fujita, H., Hayamizu, N., Goshizono, T., Sakurai, N. Electrochemical Society	9 国際会議録 Spark-Plasma-Sintering of Interconnector Material (La0.9Sr0.1)CrO3 Takeuchi, T., Takeda, Y., Funahashi, R., Aihara, T., Tabuchi, M., Kageyama, H., Nomura, K., Tanimoto, K., Miyazaki, Y. Electrochemical Society
4 国際会議録 CFD-simulation of membrane reactor for methane steam reforming Takashi Takeuchi, Masahiko Aihara, Hitoshi Habuka American Institute of Chemical Engineers	10 国際会議録 Chlorine Trifluoride Gas Transport and Etching Rate Distribution in Silicon Carbide Dry Etcher D. Yajima, K. Nakagomi, H. Habuka, T. Kato Trans Tech Publications
5 国際会議録 Etching Rate Behavior of 4H-Silicon Carbide Epitaxial Film Using Chlorine Trifluoride Gas A. Hirooka, H. Habuka, T. Kato Trans Tech Publications	11 国際会議録 A Method to Adjust Polycrystalline Silicon Carbide Etching Rate Profile by Chlorine Trifluoride Gas K. Nakagomi, S. Okuyama, H. Habuka, Y. Takahashi, T. Kato Trans Tech Publications
6 国際会議録 Off-Orientation Influence on C-Face (0001) 4H-SiC Surface Morphology Produced by Etching Using Chlorine Trifluoride Gas Y. Fukumoto, H. Habuka, T. Kato Trans Tech Publications	12 国際会議録 Development of Silicon Carbide Dry Etcher Using Chlorine Trifluoride Gas D. Yajima, H. Habuka, T. Kato Trans Tech Publications

1

2

3

4

5

6

7

8

9

10

11

12