Roles of Predominant and Subordinate Carriers in Breakdown Mechanism of High-k Gate Dielectrics Studied with HfAlOx/SiO₂ Stacks
- 著者名:
K. Okada H. Ota A. Ogawa W. Mizubayashi T. Horikawa H. Satake T. Nabatame A. Toriumi - 掲載資料名:
- Physics and Chemistry of SiO2 and the Si-SiO2 Interface-5
- シリーズ名:
- ECS transactions
- シリーズ巻号:
- 1(1)
- 発行年:
- 2005
- 開始ページ:
- 179
- 終了ページ:
- 190
- 総ページ数:
- 12
- 出版情報:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 19385862
- ISBN:
- 9781566774307 [1566774306]
- 言語:
- 英語
- 請求記号:
- E23400/1-1
- 資料種別:
- 国際会議録
類似資料:
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
MRS - Materials Research Society |
Electrochemical Society |
9
国際会議録
Characterization of Charge Trapping and Dielectric Breakdown of HfAlOx/SiON Dielectric Gate Stack
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
Materials Research Society |
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |