Spectroscopic Ellipsometry Studies of Tb-Doped SiO₂ Thin Films
- 著者名:
- 掲載資料名:
- Materials and processes for nonvolatile memories II : symposium held April 10-13, 2007, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 997
- 発行年:
- 2007
- 開始ページ:
- 363
- 終了ページ:
- 368
- 総ページ数:
- 6
- 出版情報:
- Warrendale, Pa.: Materiaeditors, Tingkai Li ... [et al.] ls Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558999572 [1558999574]
- 言語:
- 英語
- 請求記号:
- M23500/997
- 資料種別:
- 国際会議録
類似資料:
Plenum Press |
7
国際会議録
ION CHANNELING AND SPECTROSCOPIC ELLIPSOMETRY EXAMINATIONS OF THIN-FILM SiO2/EPI-Si(001) STRUCTURES
Materials Research Society |
2
国際会議録
Infrared spectroscopic ellipsometry on ferroelectric thin films and narrow-gap semiconductors
SPIE-The International Society for Optical Engineering | |
Materials Research Society | |
Trans Tech Publications |
MRS - Materials Research Society |
Electrochemical Society |
Materials Research Society |
MRS - Materials Research Society |
American Institute of Chemical Engineers |